ZEISS Sigma 300 Automatic lathe

Type of electron source: Schottky thermal field emission
Acceleration voltage: 100 V – 30 kV
Magnification: 12× – 1,000,000×
SEM resolution:
1 nm @ 30 kV
1.5 nm @ 15 kV
2.8 nm @ 1 kV
Electron beam exposure size: 20 nm
Field stitching accuracy:<100 nm
Scanning frequency: 6 MHz
Graphic format: GDSII